氧化亚硅溅射靶, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis)
Silicon(II) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis)
Silicon(II) oxide sputtering target